Whether etching Si, SiO2, doped silicate glasses, Si3N4, or other films, uniform removal is imperative.
Process tanks must be able to recirculate and filter the chemical solution while maintaining a constant temperature for SiN and Si etching.
Alkaline etching of crystalline using KOH (potassium hydroxide), TMAH (tetramethyl ammonium hydroxide), or EDP (ethylenediamene pyrocatecol) is performed for creating various feature definition in MEMS, solar cells, and integrated circuit manufacturing.
CSE System also developed propitiatory process for high temperature wet etching.
CSE Advance Wet Process Systems:
Automated Wet Process Systems – Orca Series
Semi-automated Processing Systems – Stingray Series
Manual Wet Bench Stations – Otter Series
Intelligent Process Station