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发布时间: 2016 - 06 - 22
晶片凸点电镀设备-南通华林科纳CSE 传统的IC器件是硅圆片在前工序加工完毕后,送到封装厂进行减薄、划片、引线键合等封装工序。但无论是双列直插封装(DIP),还是四边引线扁平封装(QFP),封装后的体积都比芯片本身体积大很多倍。由于手机等便携式装置的体积很小,所以要求器件的体积越小越好,像有300多个引出端的液晶显示器(LCD)驱动电路,必须采用WLP的芯片尺寸封装(CSP)。有些特殊的高频器件,为了减小引线电感的影响,要求从芯片到外电路之间的引线越短越好。在这些情况下,华林科纳的工程师采用了芯片尺寸封装(CSP),方法之一就是在芯片的引出端上制作凸焊点,例如金凸点、焊料凸点、铟凸点,然后直接倒装焊在相应的基板上。  更多晶圆电镀设备可以关注南通华林科纳半导体设备官网www.hlkncse.com;现在咨询400-8768-096,18913575037可立即免费获取华林科纳CSE提供的晶圆电镀设备的相关方案
发布时间: 2016 - 03 - 08
IPA干燥设备-华林科纳CSE南通华林科纳CSE-IPA干燥设备主要用于材料加工 太阳能电池片 分立器件 GPP等行业中晶片的冲洗干燥工艺,单台产量大,效率高设备名称南通华林科纳CSE-IPA干燥设备应用范围适用于2-8”圆片及方片动平衡精度高规格工艺时间: 一般亲水性晶圆片: ≤10 增加 @ 0.12 μm疏水性晶圆片: ≤30 增加 @ 0.12 μm金属含量: 任何金属≤ 1•1010 atoms / cm2 增加干燥斑点: 干燥后无斑点IPA 消耗量: ≤ 30 ml / run 设备制造商南通华林科纳半导体设备有限公司 www.hlkncse.com 400-8768-096 ;18913575037IPA 干燥系统组成: IPA干燥工艺原理 01: IPA干燥工艺原理 02:更多的IPA干燥系统设备相关资讯可以关注华林科纳CSE官网(www.hlkncse.com),现在热线咨询400-8768-096可立即获取免费的半导体清洗解决方案。
发布时间: 2016 - 03 - 07
刻蚀方法分为:干法刻蚀和湿法刻蚀,干法刻蚀是以等离子体进行薄膜刻蚀的技术,一般是借助等离子体中产生的粒子轰击刻蚀区,它是各向异性的刻蚀技术,即在被刻蚀的区域内,各个方向上的刻蚀速度不同,通常Si3N4、多晶硅、金属以及合金材料采用干法刻蚀技术;湿法刻蚀是将被刻蚀材料浸泡在腐蚀液内进行腐蚀的技术,这是各向同性的刻蚀方法,利用化学反应过程去除待刻蚀区域的薄膜材料,通常SiO2采用湿法刻蚀技术,有时金属铝也采用湿法刻蚀技术,国内的苏州华林科纳CSE在湿法这块做得比较好。下面分别介绍各种薄膜的腐蚀方法流程:二氧化硅腐蚀:在二氧化硅硅片腐蚀机中进行,国内腐蚀机做的比较好的有苏州华林科纳(打个广告),腐蚀液是由HF、NH4F、与H2O按一定比例配成的缓冲溶液。腐蚀温度一定时,腐蚀速率取决于腐蚀液的配比和SiO2掺杂情况。掺磷浓度越高,腐蚀越快,掺硼则相反。SiO2腐蚀速率对温度最敏感,温度越高,腐蚀越快。具体步骤为:1、将装有待腐蚀硅片的片架放入浸润剂(FUJI FILM DRIWEL)中浸泡10—15S,上下晃动,浸润剂(FUJI FILM DRIWEL)的作用是减小硅片的表面张力,使得腐蚀液更容易和二氧化硅层接触,从而达到充分腐蚀;2、将片架放入装有二氧化硅腐蚀液(氟化铵溶液)的槽中浸泡,上下晃动片架使得二氧化硅腐蚀更充分,腐蚀时间可以调整,直到二氧化硅腐蚀干净为止;3、冲纯水;4、甩干。二氧化硅腐蚀机理为:SiO2+4HF=SiF4+2H2OSiF4+2HF=H2SiF6H2SiF6(六氟硅酸)是可溶于水的络合物,利用这个性质可以很容易通过光刻工艺实现选择性腐蚀二氧化硅。为了获得稳定的腐蚀速率,腐蚀二氧化硅的腐蚀液一般用HF、NH4F与纯水按一定比例配成缓冲液。由于基区的氧化层较发射区的厚,以前小功率三极管的三次光刻(引线孔光刻)一般基极光刻和发射极光刻分步光刻,现在大部分都改为...
发布时间: 2016 - 03 - 07
设备名称:高温磷酸清洗机设备型号:CSE-SZ2011-16整机尺寸:约2800mm(L)×1200mm(w)×1900mm(H)节拍:根据实际工艺时间可调清洗量:批量清洗时,采用提篮装片,单次清洗圆片的数量要求如下2"外延片,每次不少于1蓝,每篮不少于25片4"外延片,每次不少于1蓝,每篮不少于20片6"外延片,每次不少于1蓝,每篮不少于20片框架材料:优质10mm瓷白PP板机壳,优质碳钢骨架,外包3mmPP板防腐机台底部:废液排放管路,防漏液盘结构机台支脚:有滑轮装置及固定装置,并且通过可调式地脚,可高低调整及锁定功能DIW上水管路及构件采用日本积水CL-PVC管材,排水管路材质为PP管排风:位于机台后上部工作照明:上方防酸型照明台面板为优质10mmPP板(带有圆形漏液孔,清除台面残留液体)附件:水、气枪左右各两套控制方式:PROFACE/OMRON + 三菱、OMRON 品牌 PLC 组合控制;安全保护装置:      ●设有EMO(急停装置),       ●强电弱点隔离      ●设备三层防漏  托盘倾斜   漏液报警  设备整体置于防漏托盘内台面布置图:各槽工艺参数
发布时间: 2017 - 12 - 06
芯片镀金设备-南通华林科纳CSE   晶圆电镀工艺在半导体、MEMS、LED 和 WL package 等领域中应用非常广泛。南通华林科纳的晶圆电镀设备针对这些应用研发和生产的,对所有客户提供工艺和设备一体化服务。产品分生产型和研发型两大类,适合不同客户的需求。 设备名称南通华林科纳CSE-芯片镀金设备应用领域:半导体、MEMS、LED操作模式:PLC集成控制具体应用:电镀、电铸工艺类型:电镀Au,Cu,Ni,Sn,Ag晶圆尺寸:8inch或以下尺寸,单片或多片基本配置:操作台(1套),主电镀槽(2套),腐蚀槽(2套),清洗(1套)设备功能和特点(不同电镀工艺配置有所差异) 1. 产品名称:芯片镀金设备 2. 产品系列:CSE-XL3. 晶圆尺寸:4-6inch. 4. 集成控制系统,内置MST-MP-COTROL程序 5. 主体材料:劳士领PP 6. 四面溢流设计 7. 温度控制系统:70+/-1C 8. 循环过滤出系统,流量可调。 9. 垂直喷流挂镀操作。 10. 专用阴阳极 11. 阴极摆动装置,频率可调。 12. 阳极均化装置。 13. 防氧化系统。 14. 充N2装置。 15. 排风操作台,风量可调。 16. 活化腐蚀系统。 17. 三级清洗系统。 18. 电镀液体系:均为无氰电镀液体系。 19. 工艺:表面均匀,厚度1-100um,均匀性5% 设备制造商南通华林科纳半导体设备有限公司 www.hlkncse.com 400-8768-096 ;18913575037更多晶圆电镀设备可以关注南通华林科纳半导体设备官网www.hlkncse...
发布时间: 2017 - 04 - 06
异质结高效电池(HJT、HIT)制绒清洗设备—华林科纳CSE 设备用途: 对高效太阳能电池异质结电池片进行制绒、清洗设备工艺流程:l  H2O2工艺:SC1处理→纯水清洗→去损伤→纯水清洗→制绒→纯水清洗→纯水清洗→PSC1→纯水清洗→化学抛光(HNO3)→纯水清洗→SC2处理→纯水清洗→氢氟酸洗→纯水清洗→预脱水→烘干l  O3工艺:预清洗(O3)→纯水清洗→去损伤→纯水清洗→制绒→纯水清洗→纯水清洗→PSC1→纯水清洗→化学抛光(O3)→纯水清洗→SC2处理→纯水清洗→氢氟酸洗→纯水清洗→预脱水→烘干技术特点:l  兼容MES、UPS和RFID功能l  机械手分配合理,有效避免药液交叉污染和槽体反应超时l  结构布局紧凑合理并且采用双层槽结构,设备占地空间小l  先进的400片结构,有效提高设备工艺产能l  工艺槽体采用“定排定补”模式和“时间补液”模式相结合,有效延长药液使用寿命和减少换液周期l  补配液采用槽内与补液罐双磁致伸缩流量计线性检测,以及可调节气阀控流结构,有效保证初配时间和微量精补配液的精度l  所有与液体接触材料优化升级,避免材料使用杂质析出l  采用最新低温烘干技术,保证槽内洁净度和温度控制精度技术参数:l  设备尺寸(mm):26600(L)*2800(W)*2570(H)l  Uptime:≥95%l  破片率:≤0.05%l  MTTR:4hl  MTBF:450hl  产能:6000pcs/hl  功率消耗:398KW更多异质结高效电池制绒清洗相关设备,可以关注网址:http://www.hlkncse.com,热线:400-8768-096,18913575037
发布时间: 2016 - 12 - 05
单腔立式甩干机-华林科纳CSE南通华林科纳CSE-单腔立式甩干机系统应用于各种清洗和干燥工艺设备名称南通华林科纳CSE-单腔立式甩干机优    点 清洗系统应用于各种清洗和干燥工艺 不同配置(可放置台面操作的设备、单台独立、双腔) 适用于晶圆尺寸至200mm 最佳的占地,设备带有滚轮可移动 优越的可靠性 独特的模块化结构 极其便于维修 易于使用和操作一般特征 适用于晶圆直径至200mm 25片晶圆单盒工艺 标准的高边和低边花篮 可选内置电阻率检测传感器来控制晶圆的清洗工艺 用冷或热的N2辅助晶圆干燥 离心头容易更换 图形化的界面: 基于PLC的彩色5.7“的触摸屏 可以编辑10多个菜单,每个菜单可有10步 多等级用户密  去静电装置安装于工艺腔室区 去离子水回收 电阻率监测装置 机械手自动加载 可放置台面操作的设备、单台独立、双腔 SECS/GEM 去离子水加热系统 底座置放不锈钢滚轮 溶剂灭火装置 适用特殊设计的花篮设备制造商南通华林科纳半导体设备有限公司 www.hlkncse.com 400-8768-096 ;18913575037更多的单腔立式甩干机设备相关资讯可以关注华林科纳CSE官网(www.hlkncse.com),现在热线咨询400-8768-096可立即获取免费的半导体清洗解决方案。
新闻中心 新闻资讯
Wet Processing Manual Wet Bench Stations for Clean Room ApplicationsCSE’s wet processing manual wet benches are available in a wide variety of configurations. Standard construction will support both acid and solvent applications. Our standard wet benches give you all of the process and safety features as our fully automated or semi-automated wet benches without the extra cost for robotics. Our electrical and mechanical engineers prepare sign off drawings for each wet bench order. Our 30 plus years of continues business operation gives you the satisfaction you deserve. All process, etching or c...
发布时间: 2019 - 08 - 16
浏览次数:6
Stainless Steel Solvent Stations for clean room applicationsCSE’s Stainless Steel Solvent Stations are available in Dry to Dry configuration, Fully Automated, Semi Automated, manual bench and Fume Hood design. With stainless steel construction solvent applications are easily achieved. Acetone, IPA and photo resist striping are just a few process options available. Our SolidWorks Simulation Professional and SolidWorks Flow Simulation give you the process flow characteristic you require. This advanced software will improve your etch rates and throughput which increases your yields. If required, ...
发布时间: 2019 - 08 - 16
浏览次数:8
Semi-Automated Acid Stations for clean room applicationsCSE’s Wafer Processing Equipment includes Semi-Automated Stations which are available in a wide verity of configurations. Our semi-automated robots gives you the process uniformity without paying the fully automated price. All robots are servo controlled with 3 degrees of freedom (see attached video). This motion control gives you precise developing, etching or cleaning processes. All robots are built and designed in-house giving you complete turnkey support. Our software engineers design and write the software in house. We do not outsour...
发布时间: 2019 - 08 - 16
浏览次数:8
Fully-Automated Acid/Base Stations for clean room applicationsCSE offers manual, semi-automated as well as fully automated wet process benches and chemical stations that make up an extensive product line of wafer fabrication equipment. In addition,  CSE develops customized solutions to satisfy the requirements of a wide variety of customers. CSE’s wet benches and chemical stations can handle both acid and solvent applications and all standard process sizes, from standard wafer carriers and glass substrates to 30″ x 60″ glass solar panels. The fully automated stations use in house des...
发布时间: 2019 - 08 - 16
浏览次数:8
Dry to Dry Acid/Base Wet Process equipment for clean room applicationsCSE’s Dry to Dry process equipment like our Fully Automated Equipment is available in a wide verity of configurations for your wet process requirements. We work with your engineering team to design the best wet processing / etching or cleaning equipment for your application. We handle all process sizes from standard wafer carriers, glass substrates to 30” x 60” glass solar panels. All wet process, etching or cleaning components are built and designed in-house giving you complete turnkey support. Our dry to dry proc...
发布时间: 2019 - 08 - 16
浏览次数:5
Features & Benefits:l Designed to reduce chemical and water usage and effluent costsl Proprietary nozzle for conformal etchl Separate HF and nitric acid tanks for blendingl Pre-mix reservoir, including DI water mixl Recirculated blend of acids for extended lifel Concentration monitoring available for spiking CSE Vertical Tube Wash is an acid cleaning system for quartz tubes. Acid is sprayed from an onboard reservoir. The system incorporates two holding tanks, one for HF and one for nitric, or alternative chemistries may be used depending upon the contamin...
发布时间: 2019 - 08 - 14
浏览次数:8
Solar Cell Photovoltaic Manufacturing System is optimized for manufacturing photovoltaic solar wafers. CSE wet processing systems are configurable, automated, modular, linear batch immersion systems made for high throughput at a low cost. They are designed to handle photovoltaic/ solar wafers for many applications. Features and BenefitsModular design for flexibility and ease of changeUpgradeable in the field as processes changeExpert process support including proprietary solar processesEvent and recipe driven process controlsHigh reliabilityProduction ready and maintenance friendlyBu...
发布时间: 2019 - 08 - 14
浏览次数:5
Quick Dump Rinser (QDR)Material of ConstructionNatural polypropylenePVDFPTFEQuartzWater and chemical cleanlinessA variety of valving and piping materials are available depending on specific needs for cleanliness.    Reliable microprocessor controlsMicroTech designed controllers offer complete programmability. Designed for quick and easy replacement with quick disconnects and modular parts. Modular componentsquick dump rinser - MT System, Inc. Components are easily removed for modification or preventative maintenance. FeaturesTwo removable spray manifolds with...
发布时间: 2019 - 08 - 14
浏览次数:7
Manual Wet Bench Stations   With the CSE Station, CSE continues to support and build non-automated alternatives for specific customer requirements. Our manual stations provided modularity, safety and the highest technology-to-value ratio in the industry. CSE manual systems give you a combination of performance, flexibility, and features found nowhere else.
发布时间: 2019 - 08 - 14
浏览次数:7
CSE OFFERS AN INDIVIDUALIZED APPROACH TO KOH ETCHING KOH etching is a chemical process used for the fabrication of silicon nanostructures.  This etching process has been studied extensively in both research and real-world applications.  Modutek provides individualized solutions for customers that want to use this process by using the KOH etching tank along with their existing wet bench equipment. All of Modutek’s KOH tanks are manufactured on site and built per your specifications.  All PFA material is used for cleanliness and compatibility. Definition of KOH EtchingPo...
发布时间: 2019 - 08 - 14
浏览次数:6
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